|
![](images/jp_title3_3_1.jpg) |
1. P-type Silicon
Wafer |
|
2. Texturization |
|
3. Phosphorus
Diffusion |
|
![](images/rad1.gif) |
|
![](images/rad2.gif) |
|
![](images/rad3.gif) |
|
|
|
|
|
|
|
4. Edge Isolation + Glass Removal |
|
5. Anti-Reflection Coating |
|
6. Electrode Printing |
|
![](images/rad4.gif) |
|
![](images/rad5.gif) |
|
![](images/rad6.gif) |
|
|
|
|
|
|
|
7. Firing and Contact Forming |
|
8. Testing and Classification |
|
|
|
![](images/rad7.gif) |
|
![](images/pic3_3_1_10.gif) |
|
|
|
|
|
![](images/jp_title3_3_2.jpg) |
|
![](images/pic3_3.jpg) |
![](images/jp_title3_3_3.jpg) |
|
テクスチャー |
|
|
リンドーピング拡散, PN接合形成 |
|
|
エッジ処理 + PSG除去 |
|
|
反射防止膜形成(PECVD) |
|
|
スクリーン印刷 |
|
|
焼成 |
|
|
外観及び特性検査と選別 |
|
|
|
|
|
|